The industry generally divides getter ion pumps into two types: evaporative ion pumps and sputter ion pumps. As the industry and other fields in our country keep progressing, the demand for vacuum pumps is increasing. Improving the market competitiveness of getter ion pumps is crucial to the research of these two products. Get the inspiration ion pump Next introduce the introduction of these two types of products: 1, evaporative ion pump: a combination of vacuum pump by the role of ionizing air suction and evaporation of active metal adsorption. Evaporative ion pump due to active heating of different forms of evaporation, there are a variety of different forms of structure. In the external control of the transport mechanism, the titanium wire cylinder titanium wire sent to the heating column. Heating column by the annular filament generated electron beam bombardment and heated to about 2000 ℃, titanium wire will continue to evaporate, deposited in the cooling pump body wall, the formation of fresh titanium film adsorption suction. At the same time, the gate also attracts part of the electrons emitted by the filament to make it move in the electric field at high speed to collide with the gas molecules and ionize the gas molecules. Ion in the electrostatic field to fly to the low potential of the pump wall, the new deposition of titanium film "buried", the more energy of ions can also be directly deposited into the titanium membrane deposited in the pump wall. This type of evaporative ion pump has a greater pumping speed for reactive gas and a lower pumping speed for inert gas. In order to increase the pumping rate of inert gas, the ionization probability must be increased. 2, sputtering ion pump: from two cathode plates, a honeycomb structure of the anode, a permanent magnet and the pump composed of a vacuum pump. Two cathode plates are located on both sides of the anode, the pump electrode structure. The permanent magnet is located outside the cathode and the magnetic field direction B is parallel to the direction of the electric field. In the 1000--2000 Gaussian magnetic field induction intensity, plus 3 - 7 kV DC voltage between the cathode and the anode discharge, the electromagnetic field can be constrained to 10 Pa pressure below the pressure to maintain the discharge, said the Pan said Ning discharge. Discharge, the electronic rotation in the anode cylinder reciprocating motion, greatly increasing the electronic movement, to ensure high ionization efficiency. The gas molecules are ionized ion generated to the titanium cathode accelerated. Ion energy is very large, impact on the cathode can cause strong sputtering. The sputtered titanium atoms are deposited on the inner wall of the anode barrel and the cathode is subjected to less ion bombardment. The fresh titanium film formed on the inner wall of the anode barrel absorbs the active gas and the metastable inert gas. In the area where the sputtering of the cathode is not severe Buried inert gas. However, gas molecules that reach the cathode in the ionic state are likely to desorb due to continuous ion bombardment, especially for inert gases. In the atmosphere about 1/100 of argon. The diode sputter ion pump has a very low argon pumping speed and shows regular pressure pulses at regular intervals. With the continuous improvement and progress of science and technology in our country, the development of vacuum pump is accompanied by the increasing market demand and its development speed is very fast. How getter ion pump has its own position in this fierce market, Further research is very important. How to speed up the evaporative ion pump and sputter ion pump these two types of products is of great significance. This needs to attract more professionals attention. Related articles: Gas capture pump type and model Daquan Jet vacuum pump type and model Daquan
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